English  |  正體中文  |  简体中文  |  Items with full text/Total items : 329/330
Visitors : 2113644      Online Users : 38
RC Version 5.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://tustr.lib.tust.edu.tw:8080/ir/handle/987654321/1217

Title: 解耦系統應用於空污防治
Authors: 彭逢洲
Peng, Feng-Chou
Contributors: 電機與電子工程系
Keywords: 解耦系統
空污防治
文式洗滌塔
通風網分析
Decoupling System
Exhaust Emission Control
Venturi Scrubber
Ventilation Network Analysis
Date: 2020-01-15
Issue Date: 2020-01-15 18:32:05 (UTC+8)
Abstract: 本研究目的是運用解耦系統,降低局部尾氣處理設備對晶圓製程設備造成的影響,提高晶圓製程設備尾氣排放的穩定度。實驗設置方法,是將局部尾氣處理設備設置於製程設備與中央尾氣處理系統之間,連接過程中加入耦合管,使管路形成雙迴路之通風網,並於網路內標示節點。流體轉換電路、等效電阻、平方律、ANSYS軟體計算模擬各節點,流率、壓力、氣流方向。並以耦合系統應用於文式洗滌塔來推算其最大效能。
模擬分析結果,文式洗滌塔處理流量0.1m3/s大於製程尾氣排放量0.067m3/s時,去除0.5um粉塵效能提升63%,而對製程尾氣排放影響的變動率約0.6%。由上述結果可知解耦系統能將局部尾氣處理設備的效能最佳化、改善局部尾氣處理設備對晶圓製程的影響、提供穩定的尾氣排放品質。只要空間足夠,可以運用解耦系統在排放管路中任一處加入尾氣處理設備。
The purpose of this study is to use a decoupling system to reduce the impact of local exhaust gas treatment equipment on wafer fabrication equipment and improve the stability of exhaust gas emissions from wafer fabrication equipment. In this research, the local exhaust gas treatment equipment is set between the wafer fabrication equipment and the central exhaust gas treatment system. During the connection process, a coupling tube is added to form a double-loop ventilation network, and nodes are marked in the network. Electrical circuits analogy, Equivalent resistance, Square Law, and ANSYS software are used to simulate flow rate, pressure, airflow direction each node. The research takes Venturi Scrubber with the application of decoupling system for example to estimate its maximum efficiency.
According to the simulation analysis, when the flow rate of the Venturi Scrubber treatment is 0.1m3/s and the discharge of the wafer fabrication equipment is 0.067m3/s, the efficiency of removing 0.5um dust is increased by 63% and the variability of the impact on wafer fabrication equipment emissions is approximately 0.6%. The simulation analysis results show that the coupling system can fully maximize the performance of the local exhaust gas treatment equipment, improve the impact of the local exhaust gas treatment equipment on the wafer fabrication, and provide stable exhaust gas emission quality. As long as there is enough space, the decoupling system can be used to set up the exhaust gas treatment equipment in any part of the exhaust pipe.
Appears in Collections:[電機與電子工程系] 學位論文

Files in This Item:

File Description SizeFormat
解耦系統應用於空污防治.pdf27873KbAdobe PDF50View/Open


All items in TUSTIR are protected by copyright, with all rights reserved.

 


DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback